Tailored Waveform Generator - Axiom
Tailored bias Waveform Generator: Axiom for dissociated Plasma Ion Energy and Density Control during Etching and Deposition.
The demand for computing power keeps rising. As processors and computers accelerate—key to advancing AI —integrated circuits (ICs) are being pushed to their limits. While semiconductor industry currently operates at the 3 nm node in logic, even smaller technologies are on the horizon.
Plasma etching and deposition, essential techniques for pattern transfer, remain critical for producing smaller lithographic features. However, these processes face increasing challenges in achieving greater accuracy.
Reducing system complexity, lowering energy consumption, and optimizing etching and deposition processes will be the revolutionary solutions.
Prodrive Technologies’ Tailored Waveform Generator technology for plasma biasing provides a matchless solution or unprecedented precision and control in chip manufacturing.
The demand for computing power keeps rising. As processors and computers accelerate—key to advancing AI —integrated circuits (ICs) are being pushed to their limits. While semiconductor industry currently operates at the 3 nm node in logic, even smaller technologies are on the horizon.
Plasma etching and deposition, essential techniques for pattern transfer, remain critical for producing smaller lithographic features. However, these processes face increasing challenges in achieving greater accuracy.
Reducing system complexity, lowering energy consumption, and optimizing etching and deposition processes will be the revolutionary solutions.
Prodrive Technologies’ Tailored Waveform Generator technology for plasma biasing provides a matchless solution or unprecedented precision and control in chip manufacturing.