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Etch & deposition power systems

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    Fast output response

    Responsive systems ensure optimal and fast control of plasma

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    Advanced diagnostics

    Our RF generators ensure clean and predictable plasma ignition and sustaining by integrating diagnostics.

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    High power efficiency

    Years of power electronics expertise to ensure high efficiency conversion

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    Flexible waveform

    Achieve narrow process control using tailored waveforms and accurate RF generators

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Get in control of your plasma

Drive the future of efficient and accurate plasma processing by using our novel Instant Plasma Generator and Tailored Waveform Generator technologies. Achieving microsecond-level control and high stability, our customers get in control of their plasmas to guarantee repeatable and low-damage plasma wafer processing.

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Products

Application Areas

  • Flat panel display

    Flat panel display

  • Plasma etching

  • Plasma deposition

    Plasma deposition

  • Plasma Cleaning

  • Plasma Dicing

Markets & Industries

  • Semiconductor

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    Comprehensive solutions for computing, power conversion, motion & mechatronics, imaging & sensing systems and controls

  • Flat panel display

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    Components and solutions for LED, LCD, DLP, plasma and LCD displays

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FAQ

  • Will my system still need a matchbox?

    No, our technologies are optimized to function with non-50 Ohm loads and therefore can be fit directly at the electrode. Because of this optimization, reflected power as they existed with matchboxes do not pose a risk to our system reliability or efficiency.

  • Do your technologies basically integrate matchboxes?

    No, our technologies do not require any variable components to ensure reliable power, voltage or current delivery across varying plasma conditions.

  • Have prodrives technologies been tested on real plasma chambers and will it work on my chamber (Inductively coupled, Capactively coupled etc)?

    Prodrive Technologies has worked with various research partners and customers to integrate and test the technologies on various plasma chambers including various source and electrode types.

  • Can Prodrive customize output connectors to suit existing plasma chambers?

    Yes - Prodrive commonly works together with customers to integrate systems close to the application area.

  • Can output specifications (frequency, power, voltage etc) be changed to my chamber needs?

    Yes, our systems are commonly optimized to specific situations. Based on the chamber needs we also offer optimized system control solutions.

  • Can your technologies be used for both the plasma generation and biasing?

    The Tailored Waveform Generator technology is designed for plasma biasing (IEDF control) only but the Instant Plasma Generator can be used for both biasing and plasma generation.

  • Where will the products be located on the plasma chambers?

    The products are designed to be in close proximity to the plasma chamber, aiming to fit in either the existing matchbox footprint or close to it.

Related technologies

Looking for tailored solutions?

We provide both off-the-shelf products and fully customized engineering services. Connect with our experts today to discuss your unique requirements.

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