Instant Plasma Generator
Get in control of your plasma using microsecond-level control of the RF source waveform using our Instant Plasma Generator.
Enter the Next Generation of Atomic-scale Plasma Etch and Deposition Processing by obtaining Control of the widest Window of Plasma Condition. Prodrive Technologies Introduces Solid-State Technology, replacing Mechanical Matchboxes which are challenged compensating for Varying Plasma Load conditions.
The Instant Plasma Generator offers new standards for Plasma Wafer Ignition and stabilization, utilizing high speed pulsing and near-arbitrary envelope control while maintaining accurate power delivery.
Enter the Next Generation of Atomic-scale Plasma Etch and Deposition Processing by obtaining Control of the widest Window of Plasma Condition. Prodrive Technologies Introduces Solid-State Technology, replacing Mechanical Matchboxes which are challenged compensating for Varying Plasma Load conditions.
The Instant Plasma Generator offers new standards for Plasma Wafer Ignition and stabilization, utilizing high speed pulsing and near-arbitrary envelope control while maintaining accurate power delivery.
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Single box solution
Single Box Solution instead of multiple subsystems.
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No matchbox required
Eliminates use of slow and unprecise matchboxes.
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No frequency tuning required
Saves installation, Setup and Matching Time.
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High efficiency
Achieve elimination of system losses by making matchboxes and cables obsolete.
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Microsecond-level output power settling
Control the plasma near real-time, microseconds.
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Advanced control mechanism
The generator control is optimized for use with plasma loads.
Features
- Microsecond-level waveform control
- Integrated IV sensor
- Dynamic high speed (multi-level) pulsing
- Multiple control modes
- Programmable (locked) phase
- Common Exciter synchronization (CEX)
- EtherCAT
- DC-bias measurement support
- Arc management support
Benefits
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Improved process control
Microsecond-level control ensures that processes run stable and provide optimal diagnostics.
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Reduced system complexity
Remove matchboxes, matchbox controllers and other external sensors by using a single box solution.
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Reduce process drift
Reduce process drift with very fast and stable RF generation with integrated sensors.
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Enhanced system effiency
By optimized the effiency with fewer inbetween components, the system efficiency is enhanced.
Application Areas
Market & Industries
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Semiconductor
Comprehensive solutions for computing, power conversion, motion & mechatronics, imaging & sensing systems and controls
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Flat panel display
HomeComponents and solutions for LED, LCD, DLP, plasma and LCD displays
Downloads
Let’s find the right fit!
Whether you’re ready to order or need a solution built around your requirements, we’re here to help you move forward